Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1980-03-28
1982-05-11
Cintins, Ivars C.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
75117, 156642, 204108, 210662, 210674, 210688, 423 24, C25C 112
Patent
active
043292100
ABSTRACT:
A method of regenerating etchant and recovering etched metals. Etching solution, which is overladen with metal cations is passed through a cation exchange unit. Subsequently, the etching solution, which is diminished in metal cation concentration, is returned to the etcher sump. The cation exchange unit is then rinsed with deionized water to remove residual etching solution, with the effluent being conveyed to a metal recovery unit. The cation exchange unit is then rinsed with an aqueous solution of an acid to remove cations and to regenerate the cation exchange unit. The effluent from this rinsing is also conveyed to the metal recovery unit. The cation exchange unit is then rinsed with deionized water to remove residual acid, with this effluent likewise being conveyed to the metal recovery unit. Subsequently, a selectolyte solution is passed through the cation exchange unit to enhance the cation retention property thereof. The effluent is conveyed to a storage container. At this point, etched metal can be recovered from the metal recovery unit.
REFERENCES:
patent: 3116240 (1963-12-01), Downey et al.
patent: 3725259 (1973-04-01), DePree
patent: 3905827 (1975-09-01), Goffredo et al.
patent: 4083758 (1978-04-01), Hamby et al.
patent: 4190481 (1980-02-01), Goffredo
patent: 4252621 (1981-02-01), Reinhardt et al.
Boucher R. Wayne
Dodd Jerrold J.
Henriksen Stephen R.
Merchant Vijay
Becker Robert W.
Cintins Ivars C.
LandOfFree
Method of regenerating etchant and recovering etched metal does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of regenerating etchant and recovering etched metal, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of regenerating etchant and recovering etched metal will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-754955