Method of regenerating ammoniacal etching solutions useful for e

Details Method of regenerating ammoniacal etching solutions useful for e Method of regenerating ammoniacal etching solutions useful for e

1980-04-21

1981-07-28

Tufariello, T. M.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

204130, 204151, C02F 146, C25F 702

Patent

active

042808871

ABSTRACT:
Ammoniacal etching solutions used for etching metallic copper, such as in etching galvanized printed circuits, are regenerated by electrolytically contacting a spent etching solution with a metal, such as Al or Fe, more electronegative than copper and which, in the pH range of the etching solution, forms a relatively insoluble hydroxide so that Cu++-ions are reduced to metallic copper and the etching chemicals, NH.sub.3 and NH.sub.4.sup.+, are regenerated while substantially simultaneously the more electronegative metal is oxidized into a substantially insoluble hydroxide.

REFERENCES:
patent: 3470044 (1969-09-01), Radimer
patent: 3766036 (1973-10-01), McKaveney
patent: 4035269 (1977-07-01), Mastrorilli
patent: 4152229 (1979-05-01), Soltys
German Offenlegungsschrift 26 25 869, Published Dec. 22, 1977.

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