Method of refining silicon tetrafluoride gas

Details Method of refining silicon tetrafluoride gas Method of refining silicon tetrafluoride gas

1982-08-05

1984-07-03

Thomas, Earl C.

Chemistry of inorganic compounds

Silicon or compound thereof

Halogen containing

423240, 423342, C01B 3308, B01D 5334

Patent

active

044579012

ABSTRACT:
SiF.sub.4 gas containing oxygen-containing silicofluoride(s) typified by (SiF.sub.3).sub.2 O as impurity can be refined to extremely high purity by making the SiF.sub.4 gas contact with HF in the presence of a liquid medium having strong affinity for water such as sulfuric acid or phosphoric acid. By reaction with HF, the impurity such as (SiF.sub.3).sub.2 O is converted to SiF.sub.4, while the liquid medium absorbs water formed by the reaction to thereby prevent a reverse reaction between SiF.sub.4 and H.sub.2 O to form (SiF.sub.3).sub.2 O.

REFERENCES:
patent: 2844441 (1958-07-01), Pellin
patent: 2999736 (1961-09-01), Shalit
patent: 4382071 (1983-05-01), Otsuka et al.

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