Method of refining rare gas halide excimer laser gas

Details Method of refining rare gas halide excimer laser gas Method of refining rare gas halide excimer laser gas

1986-09-22

1988-04-26

Davie, James W.

Coherent light generators

Particular active media

Gas

372 55, 372 57, 423240, H01S 322

Patent

active

047409827

ABSTRACT:
A laser gas used in a rare gas halide excimer laser is efficiently refined with little loss of the essential rare gas such as Kr, Ar or Xe by contact of the laser gas with a solid alkaline compound, e.g. Ca(OH).sub.2, for conversion of acidic impurities and also the halogen source gas such as F.sub.2 or HCl into solid metal halides and contact of the remaining gas with zeolite which is adsorbent of the remaining impurities. When the halogen source gas comprises a highly oxidizing fluorine matter the laser gas is first brought into contact with a reactive metal, e.g. Si or Fe, to convert the oxidizing fluorine matter into metal fluorides to thereby prevent formation of O.sub.2, which is obstructive to the laser operation, by reaction of the oxidizing matter with the alkaline compound. The halogen source gas too can be recovered by initially cooling the laser gas so as to cause condensation of the rare gas and impurities having relatively high boiling points and leave the halogen source gas, which is lower in boiling point, in gas phase.

REFERENCES:
patent: 4031484 (1977-06-01), Freiberg et al.
patent: 4629611 (1986-12-01), Fan
patent: 4674099 (1987-06-01), Turner
C. P. Christensen; "High Repetition . . . "; Applied Physics Letters, vol. 30, No. 9; May 1, 1977; pp. 483-484.
Excimer Lasers-1983, American Institute of Physics, "Cryogenic Gas Purification and Lifetime Extension of ArF, KrF and XeF Laser Gas Mixtures", p. 107-111.
Excimer Lasers-1983, American Institute of Physics, "A High Average Power Excimer Laser", pp. 66-72.
Applied Physics (Japanese journal), vol. 52, No. 9, pp. 749-752, "Excimer Lasers and Laser Process Techniques".

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