Cleaning and liquid contact with solids – Processes – Using sequentially applied treating agents
Reexamination Certificate
2007-04-17
2007-04-17
Markoff, Alexander (Department: 1746)
Cleaning and liquid contact with solids
Processes
Using sequentially applied treating agents
C134S003000, C134S030000, C134S902000
Reexamination Certificate
active
10701383
ABSTRACT:
The present invention relates to a method of cleaning and drying a semiconductor structure in a modified conventional gas etch/rinse or dryer vessel.
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Markoff Alexander
Micro)n Technology, Inc.
TraskBritt
LandOfFree
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