Method of reducing the defect density in a positive-working phot

Details Method of reducing the defect density in a positive-working phot Method of reducing the defect density in a positive-working phot

1977-05-20

1979-03-06

Bowers, Jr., Charles L.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 362, 96 75, 96 86P, 96 91D, 96115R, G03C 500, G03C 160

Patent

active

041428927

ABSTRACT:
The density of defects formed during the exposure of a positive resist layer, due to the loss of photoresist in circular areas is reduced by the addition of an antistatic agent. The resist layer includes a phenol-formaldehyde resin and an o-diazoquinone photoactive compound and a suitable antistatic agent is a 2-alkyl-N-hydroxyethyl imidazolinium salt.

REFERENCES:
patent: 2859112 (1958-11-01), Sus et al.
patent: 2974042 (1961-03-01), Sus et al.
patent: 3615532 (1971-10-01), Silver
patent: 3637644 (1972-01-01), Dunham et al.
patent: 3661582 (1972-05-01), Broyde
patent: 3827908 (1974-08-01), Johnson et al.
patent: 3873316 (1975-03-01), Velten et al.
patent: 3969118 (1976-07-01), Stahlhofen et al.
patent: 4009033 (1977-02-01), Bakos et al.
patent: 4036644 (1977-07-01), Kaplan et al.

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