Method of reducing reaction between hydrogen halides and olefini

Distillation: processes – separatory – Addition of material to distilland to inhibit or prevent...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

203 38, 203 62, 260654H, 2606525R, 260654S, 423488, 585 3, 585952, B01D 334, C07C 718

Patent

active

041682106

ABSTRACT:
A method for reducing losses due to reactions between hydrogen halides and olefinically unsaturated organic compounds in the presence of transition metals which act as catalysts for hydrohalogenation in mixtures containing same by adding to said mixtures a compound selected from the class consisting of alkyl diketones. The present invention is of particular value in the separation of components of said mixtures by distillation, but may also be usefully employed in any operation in which these mixtures are maintained in the presence of said catalytic materials. The present method offers advantages over the prior art because of the relative low toxicity and flammability of diketones and the fact that no undesirable solids are formed to foul process equipment as with some known methods.

REFERENCES:
patent: 2376075 (1945-05-01), Morris
patent: 2517895 (1950-08-01), Larchar
patent: 2615791 (1952-10-01), Raley
patent: 2628934 (1953-02-01), Raley et al.
patent: 2719181 (1955-09-01), Cole
patent: 3976705 (1976-08-01), Lukes et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of reducing reaction between hydrogen halides and olefini does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of reducing reaction between hydrogen halides and olefini, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of reducing reaction between hydrogen halides and olefini will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-896939

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.