Method of reducing radiation-induced damage in fused silica...

Details Method of reducing radiation-induced damage in fused silica... Method of reducing radiation-induced damage in fused silica...

2007-02-23

2009-11-17

Berman, Jack I (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S50400H, C065S028000, C359S350000, C359S355000, C359S356000

Reexamination Certificate

active

07619227

ABSTRACT:
A method of repairing radiation-induced damage and reducing accumulated laser-induced wavefront distortion and polarization-induced birefringence in a fused silica article, such as a lens in a DUV optical system, prisms, filters, photomasks, reflectors, etalon plates, and windows. The distortion is reduced by irradiating the fused silica article with an irradiation source, such as an infrared laser. The radiation causes localized heating which repairs at least a portion of the fused silica lens. A fused silica lens that has been treated by the method and a lithographic system are also described.

REFERENCES:
patent: 4641033 (1987-02-01), Petelin et al.
patent: 5896222 (1999-04-01), Rosplock et al.
patent: 2006/0107693 (2006-05-01), Trommer et al.
patent: 2006/0246694 (2006-11-01), Talwar et al.
patent: 2007/0075276 (2007-04-01), Nolscher et al.
patent: 2007/0294053 (2007-12-01), Majima et al.
patent: WO2006/040184 (2006-04-01), None
patent: WO2006/045748 (2006-05-01), None
“Modification of vacuum-ultraviolet absorption of SiOH groups in SiO2glass with temperature, F2laser radiation, and H-D isotype exchange,” Koichi Kajihara, Masahiro Hirano, Linards Skuja, Hideo Hosono, Journal of Non-Crystalline Solids, 352 (2006) 2307-2310.
“Thermal annealing of deep ultraviolet (193 nm) induced compaction in fused silica,” Fan Piao, William G. Oldham, Eugene E. Haller, J. Vac. Sci. Technol. B 16(6), Nov./Dec. 1998, 3419-3421.

Affiliated with

Also associated with

Rating

Method of reducing radiation-induced damage in fused silica... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of reducing radiation-induced damage in fused silica..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of reducing radiation-induced damage in fused silica... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4068419