Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2006-04-11
2006-04-11
Choi, Ling-Sui (Department: 1713)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S178000, C526S246000, C136S263000, C136S254000, C136S261000
Reexamination Certificate
active
07026275
ABSTRACT:
A method of reducing the photoelectric device leakage current caused by residual metal ions in conjugated polymer. A chelating agent is added to a conjugated polymer material, thereby the conductivity and mobility of metal ions under an electric field are reduced due to the chelation of metal ions by the chelating agent; therefore, the leakage current is reduced and the stability of devices is improved. Furthermore, the activity of metal ions is reduced after the metal ions are chelated by the chelating agent, improving the stability of the material and the devices. A conjugated polymer composition is also provided.
REFERENCES:
patent: 2003/0215669 (2003-11-01), Kathirgamanathan et al.
Chang Shinn-Jen
Chen Kuo-Yu
Teng Wan-Jung
Tuan Chi-Shen
Choi Ling-Sui
Industrial Technology Research Institute
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