Wells – Processes – Cementing – plugging or consolidating
Patent
1986-12-01
1987-06-30
Suchfield, George A.
Wells
Processes
Cementing, plugging or consolidating
166292, 166300, 166303, 166309, E21B 33138, E21B 4324
Patent
active
046763180
ABSTRACT:
A method of reducing the permeability of an area of a subterranean formation is disclosed. An alkali metal silicate foam is produced by injecting into the formation a solution of alkali metal silicate and a chemical surfactant, and a non-condensible gas. The foam hardens into a substantially impermeable solid. The foam may be used to reduce permeability in areas of the formation which have been steam swept during steam stimulation cycles. Thus, subsequent steam stimulation cycles will be directed to uncontacted areas of the formation.
REFERENCES:
patent: 2402588 (1946-06-01), Andresen
patent: 3285338 (1966-11-01), Boston
patent: 3379260 (1968-04-01), O'Brien
patent: 3412794 (1968-11-01), Craighead
patent: 3455392 (1969-07-01), Prats
patent: 3464491 (1969-09-01), Froning
patent: 3645336 (1972-02-01), Young et al.
patent: 3664425 (1972-05-01), Penberthy et al.
patent: 3805893 (1974-04-01), Sarem
patent: 3861469 (1975-01-01), Bayless et al.
patent: 3965986 (1976-06-01), Christopher
patent: 4004639 (1977-01-01), Sandiford
patent: 4109722 (1978-08-01), Widmyer et al.
patent: 4147211 (1979-04-01), Sandiford
patent: 4301867 (1981-11-01), Sydansk et al.
patent: 4445573 (1984-05-01), McCaleb
patent: 4548270 (1985-10-01), Eilers
Greebe Frans
Myers Ronald D.
Exxon Production Research Company
Hoster Jeffrey M.
Suchfield George A.
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