Method of reducing impurities in aqueous monomer solutions

Details Method of reducing impurities in aqueous monomer solutions Method of reducing impurities in aqueous monomer solutions

1993-05-17

1994-10-25

Manoharan, Virginia

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

203 8, 203DIG21, 20415821, 562600, C07C 5707

Patent

active

053586115

ABSTRACT:
A method of reducing the levels of impurities in aqueous monomer solutions is provided. Subjecting aqueous monomer solutions to ultraviolet radiation for from about 2 minutes to about 5 hours, reduces the level of impurities, especially carbonyl-compounds.

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