Method of reducing carbon incorporation into films produced by c

Details Method of reducing carbon incorporation into films produced by c Method of reducing carbon incorporation into films produced by c

1996-09-18

1997-11-25

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427533, 427535, 4272551, 4272552, 4272557, 134 11, 134 12, 437937, C23C 1656

Patent

active

056910096

ABSTRACT:
A method of reducing carbon incorporation into films is disclosed which comprises the steps of depositing a layer on a substrate by CVD using organic precursors, the layer comprising hydrocarbons or carbides; and utlizing a reactive hydrogen plasma to displace the hydrocarbons or carbides away from the layer.

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