Method of reducing a wave front aberration, and computer...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S077000, C355S055000

Reexamination Certificate

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07580113

ABSTRACT:
A method of reducing a wave front aberration is provided for a lithographic process whereby the reducing is based on the selected pattern to be printed and the selected illumination mode used for exposure. Wave front aberrations of a projection system of a lithographic apparatus are measured and reduced by calculating adjustments of optical elements of the projection system and applying the calculated adjustments to the projection system. The calculation of adjustments is based on information on a spatial distribution of radiant intensity in a pupil of the projection system as present during exposing the radiation sensitive layer, and is limited to aberrations in projection lens pupil areas of relative high radiant flux.

REFERENCES:
patent: 6710856 (2004-03-01), Van Der Laan et al.
patent: 6809797 (2004-10-01), Baselmans et al.
patent: 2002/0001088 (2002-01-01), Wegmann et al.
patent: 2003/0071986 (2003-04-01), Geh et al.
patent: 2005/0128447 (2005-06-01), Shiode
patent: 2005/0254024 (2005-11-01), Marie Van Greevenbroek et al.
Shimizu et al., “Abberration Optimizing System Using Zernike Sensitivity Method”, Proceedings of SPIE, vol. 5040 (2003), pp. 1581-1590.

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