Method of reacting excess CVD gas reactant

Details Method of reacting excess CVD gas reactant Method of reacting excess CVD gas reactant

1998-10-19

2000-11-07

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

427253, 118715, C23C 1608

Patent

active

061433616

ABSTRACT:
Method and apparatus for controlling deposition from excess gaseous reactant in an exhaust conduit of a chemical vapor deposition apparatus involves introducing a gaseous chemical reactant in the exhaust stream effective to react with the excess gaseous reactant in the exhaust stream to form solid reaction product particulates in a manner that reduces harmful deposition of liquid and/or solid metal in the exhaust system.

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