Method of providing vaporized halide-free, silicon-containing co

Details Method of providing vaporized halide-free, silicon-containing co Method of providing vaporized halide-free, silicon-containing co

1994-12-30

1997-05-27

Hoffmann, John

Glass manufacturing

Processes of manufacturing fibers, filaments, or preforms

Process of manufacturing optical fibers, waveguides, or...

261DIG65, 118726, 427167, 122 40, C03B 37014

Patent

active

056327978

ABSTRACT:
A vaporizer for halide-free, silicon-containing liquid reactants used in producing preforms is provided. The vaporizer includes a heated, vertically-oriented expansion chamber (20) and a vertical hollow shaft (42) which extends into the chamber and has a plurality of orifices (45) at its upper end (44). Preheated reactant is supplied to the vertical shaft (42) at an elevated pressure and is sprayed onto the chamber's heated wall (22) by the orifices (45). A portion of the liquid reactant vaporizes upon entering the internal volume (24) of the chamber (20) due to the pressure drop between the inside of the shaft and the inside of the chamber. The remainder of the liquid reactant vaporizes by being heated through contact with the chamber's wall (22). Higher molecular weight species present in the raw material or generated by the vaporization process are collected in the bottom portion of the chamber where they can be periodically removed.

REFERENCES:
patent: 2505170 (1950-04-01), Burnstein
patent: 2790428 (1957-04-01), Buttler
patent: 3110797 (1963-11-01), Vanne
patent: 3410986 (1968-11-01), Groom
patent: 4212663 (1980-07-01), Aslami
patent: 4314837 (1982-02-01), Blankenship
patent: 4450118 (1984-05-01), Tuin
patent: 4529427 (1985-07-01), French
patent: 4938789 (1990-07-01), Tsuchiya et al.
patent: 5043002 (1991-08-01), Dobbins et al.
patent: 5078092 (1992-01-01), Antos et al.
patent: 5090985 (1992-02-01), Soubeyrand et al.
patent: 5356451 (1994-10-01), Cain et al.
Translation of J.P. 125633-1983, Chitct.

Affiliated with

Also associated with

Rating

Method of providing vaporized halide-free, silicon-containing co does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of providing vaporized halide-free, silicon-containing co, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of providing vaporized halide-free, silicon-containing co will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2326036