Method of providing uniform photoresist coatings for tight contr

Details Method of providing uniform photoresist coatings for tight contr Method of providing uniform photoresist coatings for tight contr

1997-03-10

1999-11-16

Beck, Shrive

Coating processes

Centrifugal force utilized

427314, 4274071, 427337, 427384, 438761, 438782, B05D 312, B05D 302, H01L 2131

Patent

active

059853638

ABSTRACT:
A method for providing a uniform coating of photoresist over substrate for defining high density integrated device and circuit patterns. This is accomplished by applying the photoresist onto the substrate in multiple, separate dispensing steps and leveling spins to attain the designed thickness uniformly over substrate having high topographic surfaces, thereby preserve the integrity of the critical dimension for multi-level alignments used in the fabrication of integrated devices and circuits.

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