Metal working – Method of mechanical manufacture – Electrical device making
Patent
1991-06-21
1992-12-22
Arbes, Carl J.
Metal working
Method of mechanical manufacture
Electrical device making
29827, 174 524, H05K 334
Patent
active
051724715
ABSTRACT:
A CMOS integrated circuit assembly for providing reduced power supply and ground inductances has a first conducting layer which is formed over an insulating layer formed on top of the integrated-circuit chip. The first conducting layer is connected to wire bond pads which are wirebonded to a package. This first conducting layer forms a single, low-inductance conductor for a VDD supply voltage and extends over a substantial area so that it has an inductance significantly less than the inductance of a conventional conductor. A second conducting layer is forms a low-inductance VSS conductor. Power can be selectively distributed through conductive layers of this to provide power supply isolation between selected circuits of the integrated circuit.
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Arbes Carl J.
VLSI Technology Inc.
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