Coating processes – Coating by vapor – gas – or smoke
Patent
1991-10-02
1994-06-21
Beck, Shrive
Coating processes
Coating by vapor, gas, or smoke
118715, 118726, C23C 1400, C23C 1600
Patent
active
053227107
ABSTRACT:
A method is described of providing a substrate (2) with a surface layer from a gas phase with a vapor in a reactor chamber (1), which vapor is generated through evaporation of a substance (5) in a reservoir (4) and is conducted to the reactor chamber (1) through a gas line (8) (Chemical Vapor Deposition (CVD)). According to the invention, the vapor is conducted from the reservoir (4) to the reactor chamber (1) in that it is pumped from the reservoir (4) to the reactor chamber (1) by a pump (9) included in the gas line. The use of the pump renders the method very flexible. Thus the vapor flow can be easily adapted through adaptation of a pumping rate associated with the pump. In addition, the vapor flow is not dependent on a process pressure which prevails in the reactor (1).
REFERENCES:
patent: 4436674 (1984-03-01), McMenamin
patent: 4783343 (1988-11-01), Sato
patent: 4842827 (1989-06-01), Graf et al.
patent: 4849259 (1989-07-01), Biro et al.
patent: 4911101 (1990-03-01), Ballingall, III et al.
1989 Leybold Heraus Vacuum Products and Technology-catalog Leybold Heraus Vacuum Products, Inc. p. 5.
Beck Shrive
Chen Bret
Miller Paul R.
U.S. Philips Corporation
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