Method of providing a small-sized opening, use of this method fo

Metal working – Method of mechanical manufacture – Assembling or joining

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29579, 29589, 29590, 357 15, 357 22, 156651, H01L 3922

Patent

active

045177309

ABSTRACT:
The invention relates to a method of providing a small-sized opening for manufacturing semiconductors, such as field effect transistors having an aligned gate in the submicron range, as well as to transistors obtained by this method. In general, the invention consists in that an intermediate window is formed to provide the aligned gate in a semiconductor, which window is eliminated after forming the gate. The invention is used in the field of electronics, more particularly, in the manufacture of semiconductor elements.

REFERENCES:
patent: 3898353 (1975-08-01), Napoli et al.
patent: 4077111 (1978-03-01), Driver et al.
patent: 4194285 (1980-03-01), Goel
patent: 4334349 (1982-06-01), Aoyama et al.
patent: 4414738 (1983-11-01), Jelks et al.

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