Method of providing a patterned layer of silicon-containing oxid

Details Method of providing a patterned layer of silicon-containing oxid Method of providing a patterned layer of silicon-containing oxid

1974-09-26

1976-07-13

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

96 351, 96 362, 20415913, 427273, B05D 306

Patent

active

039695433

ABSTRACT:
The invention relates to a method of providing a patterned silicon-containing oxide layer on a substrate, by providing a coating comprising a polymerizable siloxane material on the substrate, locally exposing the coating to radiation in accordance with the desired pattern, then developing the exposed coating and converting the siloxane material pattern into the patterned silicon-containing oxide layer.

REFERENCES:
patent: 3272670 (1966-09-01), Myers
patent: 3726710 (1973-04-01), Berger et al.
patent: 3825466 (1974-07-01), Martin et al.
patent: 3847771 (1974-11-01), McGinniss
patent: 3852097 (1974-12-01), Owen et al.
patent: 3865588 (1975-02-01), Ohto et al.
patent: 3873499 (1975-03-01), Michael et al.
patent: 3877980 (1975-04-01), Martin et al.

Affiliated with

Also associated with

Rating

Method of providing a patterned layer of silicon-containing oxid does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of providing a patterned layer of silicon-containing oxid, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of providing a patterned layer of silicon-containing oxid will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1740608