Abrading – Abrading process
Patent
1995-05-23
1997-02-25
Little, Willis
Abrading
Abrading process
451 41, 451 54, 451 57, 451388, 269 21, 437226, 148DIG28, B24B 4106
Patent
active
056054890
ABSTRACT:
A processing fixture and method of fabricating micromechanical devices, such as digital micromirror devices, that allows fragile structures on wafer 22 to be protected from debris during the saw operation and subsequent cleaning operations. The wafer 22 is attached to a vacuum fixture 26 after partially sawing the wafer 22 to create saw kerfs. The backside of the wafer 22 is then ground down to the saw kerfs 24 to separate the devices 32. Each device 32 is held on the fixture by a vacuum in the headspace above the device 32. In an alternate embodiment the devices are separated by sawing completely through the wafer while in the fixture.
REFERENCES:
patent: 3809050 (1974-05-01), Chough et al.
patent: 3811182 (1974-05-01), Ryan, Sr. et al.
patent: 3971170 (1976-07-01), Coburn et al.
patent: 3976288 (1976-08-01), Cuomo, Jr.
patent: 3994101 (1976-11-01), Coburn et al.
patent: 4138304 (1979-02-01), Gantley
patent: 4184292 (1980-01-01), Defazio et al.
patent: 4213698 (1980-07-01), Firtion et al.
patent: 4669226 (1987-06-01), Mandler
patent: 5029418 (1991-07-01), Bull
patent: 5291692 (1994-03-01), Takahashi et al.
patent: 5314844 (1994-05-01), Imamura
patent: 5415581 (1995-05-01), Bando
patent: 5527744 (1996-06-01), Mignardi et al.
Pelletier, Vacuum Handler for Diced Wafers, IBM Technical Disclosure Bulletin, vol. 24, No. 7A, Dec. 1981, p. 3484.
Gale Richard O.
Mignardi Michael A.
Brill Charles A.
Donaldson Richard L.
Kesterson James C.
Little Willis
Morgan Eileen P.
LandOfFree
Method of protecting micromechanical devices during wafer separa does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of protecting micromechanical devices during wafer separa, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of protecting micromechanical devices during wafer separa will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1971640