Method of protecting an element of an integrated circuit...

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor

Reexamination Certificate

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C438S595000

Reexamination Certificate

active

07018865

ABSTRACT:
A semiconductor material is protected against the formation of a metal silicide by forming a layer of a silicon/germanium alloy on the material. The material which is protected belongs to a component of an integrated circuit comprising other components that have to be subjected to a siliciding operation. The method of protection includes depositing a layer of silicon/germanium alloy on the integrated circuit. The layer of silicon/germanium alloy is then removed from the areas to be silicided. A metal is then deposited on the structure and a metal silicide is formed therefrom. The unreacted metal and the metal/silicon/germanium ternary alloy that may have formed are removed, and the layer of silicon/germanium alloy is removed so as to expose the unsilicided component.

REFERENCES:
patent: 5336903 (1994-08-01), Ozturk
patent: 6214679 (2001-04-01), Murthy
patent: 6388296 (2002-05-01), Hsu
patent: 6399487 (2002-06-01), Lai
patent: 6465317 (2002-10-01), Marty
patent: 6596594 (2003-07-01), Guo
French Preliminary Search Report, FR 03 07690, dated Mar. 3, 2004.

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