Method of projecting photoelectron image

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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2504923, H01L 2130, G03F 727

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active

047897864

ABSTRACT:
A method for projecting a photelectron image includes providing a mask substrate, and selectively contacting a layer which lowers the work function of the mask substrate thereto. Photoelectrons are emitted from the contacted portion.

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patent: 4467210 (1984-08-01), Sugihara et al.
patent: 4572956 (1986-02-01), Tojo et al.

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