Method of projecting a beam of charged particles

Details Method of projecting a beam of charged particles Method of projecting a beam of charged particles

1976-10-15

1978-09-05

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, A61K 2702

Patent

active

041123050

ABSTRACT:
Disclosed is a method of projecting on selected areas of a target a variety of charged particles each having a different shape of cross-section. The charged particle projecting method according to this invention is suitable for production of micro-circuits.
A microcircuit is formed on a wafer in the form of patchwork by repeatedly exposing a selected area of the wafer to each of a variety of charged particle beams, thus shortening the time involved for production compared with the time which would be taken if a similar microcircuit is produced by blotting selected areas of the wafer with beam spot.

REFERENCES:
patent: 3644700 (1972-02-01), Kruppa et al.
patent: 3922546 (1975-11-01), Livesay
patent: 3936693 (1976-02-01), Parks et al.

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