Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly alloy coating
Patent
1994-10-17
1996-02-27
Utech, Benjamin
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Depositing predominantly alloy coating
205241, 427249, 4272551, 427437, C25D 358
Patent
active
054945658
ABSTRACT:
Workpieces of non-corrosion-resistant metals are provided with a wear-resistant, non-metallic layer of a nitride, carbide, boride, oxide or silicide of an element of the fourth to the sixth subgroup applied by PVD (physical vapor deposition) after a corrosion-resistant intermediate layer had been previously applied. An intermediate layer consisting of a copper-tin alloy with 45 to 80% copper, 10 to 55% tin and 0 to 15% zinc proved to be corrosion-resistant and noble and in addition does not cause any skin allergy.
REFERENCES:
patent: 1970549 (1934-08-01), Batten et al.
patent: 4036602 (1977-07-01), Dean et al.
patent: 4557980 (1985-12-01), Hodnett, III
patent: 4565608 (1986-01-01), Hoffacker et al.
patent: 4605474 (1986-08-01), Hoffacker et al.
patent: 5192410 (1993-03-01), Ito et al.
Patent Abstracts of Japan, vol. 12, No. 446, English language abstract of JP 63 171 867.
Patent Abstracts of Japan, vol. 15, No. 496, English language abstract of JP 03 215 658.
Patent Abstracts of Japan, vol. 10, No. 310, English language abstract of JP 61 119 668.
"Ullmanns Encyklopadie der Technischen Chemie", 4th edition, vol. 12, pp. 190-194.
Engert Thomas
Schenzel Heinz-Guenther
Degussa - Aktiengesellschaft
Utech Benjamin
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