Method of producing tungsten-titanium sputter targets and target

Details Method of producing tungsten-titanium sputter targets and target Method of producing tungsten-titanium sputter targets and target

1991-04-15

1993-08-10

Walsh, Donald P.

Specialized metallurgical processes, compositions for use therei

Compositions

Consolidated metal powder compositions

75235, 419 19, 419 23, 419 39, 419 49, 420430, C22C 2704, B22F 100

Patent

active

052344878

ABSTRACT:
Tungsten-titanium sputter targets of at least 95% theoretical density are provided with little or no .beta.(Ti, W) phase constituent. Such targets will minimize troublesome particulate emissions during sputter coating conditions.

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