Coating processes – Direct application of electrical – magnetic – wave – or... – Electrostatic charge – field – or force utilized
Patent
1999-03-29
2000-05-09
Parker, Fred J.
Coating processes
Direct application of electrical, magnetic, wave, or...
Electrostatic charge, field, or force utilized
427421, B05D 104
Patent
active
060601280
ABSTRACT:
A method for producing a thin film or nanoparticle deposit includes the step of providing a working liquid, movement of the working liquid at a liquid surface prevented by surface tension. The method also includes the steps of supplying an electric charge having a first polarity to the working liquid at the liquid surface to overcome surface tension at the liquid surface to produce a first plurality of charged nanodrops and directing the first plurality of charged nanodrops against a substrate surface. The method further includes the steps of supplying an electric charge having a second polarity to the working liquid at the liquid surface, the second polarity being opposite to the first polarity, to overcome surface tension at the liquid surface to produce a second plurality of charged nanodrops, and directing the second plurality of charged nanodrops against the substrate surface. The method additionally includes the step of alternating between supplying the electric charge having the first polarity and supplying the electric charge having the second polarity to the working liquid at the liquid surface. An apparatus for producing a thin film or nanoparticle deposit includes an apparatus for supplying a working liquid, surface tension preventing movement of the working liquid from the apparatus for supplying a working fluid at a liquid surface, an apparatus for supplying an electric charge to the working liquid at the liquid surface to overcome the surface tension to produce a stream of nanodrops, and an apparatus for supplying electric charge of alternating polarity to the apparatus for supplying the electric charge to the working liquid at the liquid surface.
REFERENCES:
patent: 1958406 (1934-05-01), Darrah
patent: 3717875 (1973-02-01), Arciprete et al.
patent: 4264641 (1981-04-01), Mahoney et al.
patent: 4280130 (1981-07-01), Slemmons
patent: 4476515 (1984-10-01), Coffee
patent: 4549243 (1985-10-01), Owen et al.
patent: 4574092 (1986-03-01), Gourdine
patent: 4748043 (1988-05-01), Seaver et al.
patent: 4762553 (1988-08-01), Savage et al.
patent: 4762975 (1988-08-01), Mahoney et al.
patent: 4925699 (1990-05-01), Fagan
patent: 4929400 (1990-05-01), Rembaum et al.
patent: 4993361 (1991-02-01), Unvala
patent: 5115971 (1992-05-01), Greenspan et al.
patent: 5222663 (1993-06-01), Noakes et al.
patent: 5229171 (1993-07-01), Donovan et al.
patent: 5344676 (1994-09-01), Kim et al.
patent: 5514423 (1996-05-01), Krish et al.
Woosley, J. et al., "Field injection electrosttaic spraying of liquid hydrogen," J. Appl. Phys., vol. 64, No. 9 (Nov. 1988) pp. 4278-4284.
Woosley, J. et al., "Electrostatic Spraying of Insulating Lquids: H.sub.2 ", IEEE Trans. Ind. Appl., vol. IA-18, No. 3 (May/Jun. 1982) pp. 314-320.
Kim, K. et al., "Generation of charged drops of insulating liquids by electrostatic spraying," J. Appl. Phys., vol. 47, No. 5 (May 1976) pp. 1964-1969.
Feng Qichen
Kim Kyekyoon
Parker Fred J.
The Board of Trustees of the University of Illinois
LandOfFree
Method of producing thin film and nanoparticle deposits using ch does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of producing thin film and nanoparticle deposits using ch, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing thin film and nanoparticle deposits using ch will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1062616