Method of producing synthetic quartz glass

Details Method of producing synthetic quartz glass Method of producing synthetic quartz glass

1980-02-13

1982-03-16

Lindsay, Jr., Robert L.

Glass manufacturing

Processes

With coating

65 312, 350 9630, 427 34, 427167, C03C 1700, C03C 1702, C03C 2502

Patent

active

RE0308838

ABSTRACT:
An improvement in a method for producing a synthetic hydroxyl ion-free quartz glass wherein a hydrogen free silicon compound is heated in a hydrogen-free gas stream while the gas stream is passed through an induction coupled plasma burner, the gas stream containing elemental and/or bound oxygen and the oxidation product is deposited on a refractory support as a vitreous mass, the improvement lying in including in the gas stream a gaseous hydrogen-free, thermally decomposable compound which yields fluorine in an amount of at least 500 gms. per kilogram of silica to be produced; an apparatus for producing a synthetic OH ion-free quartz glass comprising an induction coupled plasma burner which burner has disposed thereabout 3 concentric quartz glass tubes disposed in stepped configuration of which the outermost tube is the longest and the innermost tube is the shortest. The apparatus includes means for passing through the innermost tube a hydrogen-free gas stream containing elemental oxygen and/or bound oxygen together with a gaseous hydrogen free thermally decomposable compound which yields fluorine. The apparatus further contains means for passing a separating gas such as oxygen through the space defined by the innermost tube and the middle tube and the middle tube and the outermost tube.

REFERENCES:
patent: 3275408 (1966-09-01), Winterburn
patent: 3659915 (1972-05-01), Maurer et al.
patent: 3778132 (1973-12-01), Pinnow et al.
patent: 3843229 (1974-10-01), Rosenberger
patent: 3981707 (1976-09-01), Araujo et al.

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