Metal treatment – Compositions – Heat treating
Patent
1981-04-03
1983-03-15
Roy, Upendra
Metal treatment
Compositions
Heat treating
148187, 156643, 427336, 430312, G03C 500, C03C 1500, C03C 2706
Patent
active
043766587
ABSTRACT:
Structures composed of photosensitive resist are produced for semiconductor circuits by first generating a mask of a photosensitive resist onto a substrate and then applying a layer of a photosensitive resist over the entire surface of the substrate, including the first generated mask, so that such mask dissociates or dissolves by the material of the subsequently applied layer, which is then structured. In this manner, an improved adhesion of the resist structures to the substrate is achieved and simultaneously cleansing steps are eliminated. The inventive process is utilized for all processes during manufacture of semiconductor circuits wherein at least two photolithographic processes occur without the intervention of a high temperature step.
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patent: 3957552 (1976-05-01), Ahn et al.
patent: 4088490 (1978-05-01), Duke et al.
patent: 4201800 (1980-05-01), Alcorn et al.
patent: 4253888 (1981-03-01), Kikuchi
Bickford et al., IBM-TDB, 16 (1973) 47.
Kaplan et al., IBM-TDB, 15 (1972) 2239.
S. S. Liu et al, "A High-Performance MOS Technology for 16K Static RAM", IEDM Digest of Technical Papers, (Dec. 1979), pp. 352-354.
Roy Upendra
Siemens Aktiengesellschaft
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