Method of producing silicon nitride ceramic component

Details Method of producing silicon nitride ceramic component Method of producing silicon nitride ceramic component

1995-04-26

1997-02-04

Czaja, Donald E.

Plastic and nonmetallic article shaping or treating: processes

Disparate treatment of article subsequent to working,...

Effecting temperature change

264 60, 264235, 264345, 264346, B29C 7102

Patent

active

055994938

ABSTRACT:
A method of producing a silicon nitride ceramic component, comprising: grinding a silicon nitride sintered body comprising .alpha.--Si.sub.3 N.sub.4 having an average grain size of 0.5 .mu.m or smaller and .beta.'-sialon having an average grain size of 3 .mu.m or smaller in major axis and 1 .mu.m or smaller in minor axis into a predetermined size with a surface roughness of 1-7 .mu.m in ten-point mean roughness; heat treating the same at temperature range of 800.degree.-1200.degree. C. in the air; and standing it to allow to be cooled, whereby providing a residual stress in the ground surface before and after the heat treating as a residual compressive stress at a ratio of 1 or higher of the residual compressive stress after the heat treating to that before the heat treating (residual compressive stress after the heat treating/residual compressive stress before the heat treating), preferably 5 or more.

REFERENCES:
patent: 5369065 (1994-11-01), Yoshimura et al.
patent: 5384292 (1995-01-01), Matsui et al.
Copy of Database WPI, Week 8525, Derwent Publ., Ltd, London, G.B. AN 85-149087 & JP-A-60 081 076 (Hitachi KK) May 9, 1985 Abstract.

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