Metal treatment – Compositions – Heat treating
Patent
1980-02-25
1981-09-29
Roy, Upendra
Metal treatment
Compositions
Heat treating
148187, 357 91, 427 531, H01L 2126, H01L 21263
Patent
active
042920914
ABSTRACT:
A method of producing a semiconductor device comprises a step of forming a field isolating oxide layer from an amorphous silicon layer by oxidation at a relatively low temperature. Prior to the oxidizing treatment, a portion of the amorphous silicon layer is recrystallized into a single-crystalline silicon layer by laser irradiation.
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Roy Upendra
Vlsi Technology Research Association
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