Method of producing semiconductor device and photomask therefor

Details Method of producing semiconductor device and photomask therefor Method of producing semiconductor device and photomask therefor

1991-07-16

1995-04-04

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430319, G03F 900

Patent

active

054036810

ABSTRACT:
In a wafer process of a semiconductor device, disclosed are photomasks and a semiconductor device producing method. In forming a plurality of semiconductor chips on a semiconductor substrate by using a plurality of photomasks, at least one photomask 10 having an effective chip arrangement composed of a grid-like pattern 80 which does not form chips incomplete in appearance and/or in function in an outer circumferential range of a wafer 3 is used in the exposure step.

REFERENCES:
patent: 4710440 (1987-12-01), Del Priore
patent: 4881257 (1989-11-01), Nakagawa

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