Method of producing semiconductor device and photomask therefor

Details Method of producing semiconductor device and photomask therefor Method of producing semiconductor device and photomask therefor

1995-01-30

1996-08-13

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

430 5, 430311, 430319, 437 51, 437 80, 437928, G03F 900

Patent

active

055454984

ABSTRACT:
In a wafer process of a semiconductor device, disclosed are photomasks and a semiconductor device producing method. In forming a plurality of semiconductor chips on a semiconductor substrate by using a plurality of photomasks, at least one photomask 10 having an effective chip arrangement composed of a grid-like pattern 80 which does not form chips incomplete in appearance and/or in function in an outer circumferential range of a wafer 3 is used in the exposure step.

REFERENCES:
patent: 4710440 (1987-12-01), Del Priore
patent: 4881257 (1989-11-01), Nakagawa
patent: 5403681 (1995-04-01), Konno

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