Method of producing PuO.sub.2 by calcination of Pu oxalate produ

Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Radioactive metal

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423251, C01G 5600

Patent

active

042985790

ABSTRACT:
Conversion of plutonium nitrate containing americium as a contaminant into plutonium dioxide while concurrently preventing americium contaminant from passing into the plutonium dioxide product. Discontinuous precipitation of plutonium oxalate is effected by maintaining the Pu nitrate-nitric acid solution containing americium in a reaction vessel at 60.degree.-95.degree. C., adding granular solid oxalic acid or solid ammonium oxalate in freeflowing form substantially free of clusters and lumps in stoichiometric deficiency of up to 7% of oxalic acid for reaction with the Pu in the solution; separating resultant Pu oxalate precipitate into which at least a portion of the americium contaminant has been prevented from entering, and calcining the purified Pu oxalate precipitate to PuO.sub.2.

REFERENCES:
patent: 2833800 (1958-05-01), Mastick et al.
patent: 2867640 (1959-01-01), Gofman
patent: 2868620 (1959-01-01), Garner
patent: 2906597 (1959-09-01), Ritter et al.
patent: 4025602 (1977-05-01), Campbell et al.
Doty, J. W. et al., "Preparation of Micron-Sized 238 PuO.sub.2 " In J. of Nuc. Matr. 35(2): 247-249, 1970.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of producing PuO.sub.2 by calcination of Pu oxalate produ does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing PuO.sub.2 by calcination of Pu oxalate produ, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing PuO.sub.2 by calcination of Pu oxalate produ will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1064262

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.