Method of producing polishing pad

Details Method of producing polishing pad Method of producing polishing pad

2011-07-05

2011-07-05

Mayes, Melvin C (Department: 1732)

Abrasive tool making process, material, or composition

Impregnating or coating an abrasive tool

Reexamination Certificate

active

07972396

ABSTRACT:
The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the cladding comprises a hydrophobic polymer; (b) impregnating the surface of the base material with an elastomer solution; (c) coagulating the elastomer impregnated in the surface of the base material to mold the elastomer and to form a plurality of first continuous pores between the elastomer, and between the elastomer and the fibers; (d) planarizing the surface of the base material; (e) impregnating the surface of the base material and elastomer obtained in the step (d) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.

REFERENCES:
patent: 4927432 (1990-05-01), Budinger et al.
patent: 5197999 (1993-03-01), Thomas
patent: 5578362 (1996-11-01), Reinhardt et al.
patent: 6089965 (2000-07-01), Otawa et al.
patent: 6117000 (2000-09-01), Anjur et al.
patent: 6217434 (2001-04-01), Roberts et al.
patent: 6368200 (2002-04-01), Merchant et al.
patent: 6383066 (2002-05-01), Chen et al.
patent: 6454634 (2002-09-01), James et al.
patent: 6533645 (2003-03-01), Tolles
patent: 6626740 (2003-09-01), Baker et al.
patent: 6641463 (2003-11-01), Molnar
patent: 6852020 (2005-02-01), Petroski et al.
patent: 6989117 (2006-01-01), Chen et al.
patent: 7141155 (2006-11-01), Bunyan et al.
patent: 2002/0077034 (2002-06-01), Tolles
patent: 2003/0003846 (2003-01-01), Tolles
patent: 2004/0048559 (2004-03-01), Park et al.
patent: 2004/0224623 (2004-11-01), Nishiyama et al.
patent: 2005/0215177 (2005-09-01), Prasad
patent: 2005/0255794 (2005-11-01), Vangsness et al.
patent: 486407 (2000-11-01), None

Affiliated with

Also associated with

Rating

Method of producing polishing pad does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing polishing pad, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing polishing pad will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2720649