Method of producing phase shift mask blank, method of...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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Reexamination Certificate

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10806202

ABSTRACT:
There is disclosed a method of producing a phase shift mask blank wherein the method includes at least a step of forming one or more layers of phase shift films on a substrate by a sputtering method, and in the step, the phase shift films are formed by the sputtering method while simultaneously discharging plural targets having different compositions. Thereby, a phase shift mask blank having a desired composition and quality, in particular, having a phase shift film with few defects can be easily produced.

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patent: 6635155 (2003-10-01), Miyamura et al.
patent: 6858357 (2005-02-01), Angelopoulos et al.
patent: A 7-140635 (1995-06-01), None
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patent: A-11-282150 (1999-10-01), None
patent: A-2002-072443 (2002-03-01), None
patent: A-2003-005347 (2003-01-01), None

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