Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2008-03-18
2008-03-18
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07344806
ABSTRACT:
There is disclosed a method of producing a phase shift mask blank wherein the method includes at least a step of forming one or more layers of phase shift films on a substrate by a sputtering method, and in the step, the phase shift films are formed by the sputtering method while simultaneously discharging plural targets having different compositions. Thereby, a phase shift mask blank having a desired composition and quality, in particular, having a phase shift film with few defects can be easily produced.
REFERENCES:
patent: 6153341 (2000-11-01), Mitsui et al.
patent: 6569577 (2003-05-01), Isao et al.
patent: 6635155 (2003-10-01), Miyamura et al.
patent: 6858357 (2005-02-01), Angelopoulos et al.
patent: A 7-140635 (1995-06-01), None
patent: A-08-137094 (1996-05-01), None
patent: A-11-282150 (1999-10-01), None
patent: A-2002-072443 (2002-03-01), None
patent: A-2003-005347 (2003-01-01), None
Fukushima Noriyasu
Inazuki Yukio
Kaneko Hideo
Okazaki Satoshi
Yoshikawa Hiroki
Oliff & Berridg,e PLC
Rosasco S.
Shin-Etsu Chemical Co. , Ltd.
LandOfFree
Method of producing phase shift mask blank, method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of producing phase shift mask blank, method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing phase shift mask blank, method of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2811850