Method of producing oxide ceramic layers on barrier layer-formin

Details Method of producing oxide ceramic layers on barrier layer-formin Method of producing oxide ceramic layers on barrier layer-formin

1992-11-25

1995-01-31

Niebling, John

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Forming nonmetal coating

205321, 205322, 205323, 205324, C25D 906

Patent

active

053856627

ABSTRACT:
A method of producing oxide ceramic layers on Al, Mg, Ti, Ta, Zr, Nb, Hf, Sb, W, Mo, V, Bi or their alloys by a plasma-chemical anodical oxidation in a chloride-free electrolytic bath having a pH value of 2 to 8 and a constant bath temperature of -30.degree. to +15.degree. C. A current density of at least 1 A/dm.sup.2 is maintained constant in the electrolytic bath until the voltage reaches a predetermined end value.

REFERENCES:
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patent: 4481083 (1984-11-01), Ball et al.
patent: 4869789 (1989-09-01), Kurze et al.
patent: 4898651 (1990-02-01), Mahmoud
Van et al. "Mechanism of Anodic Spark Deposition" in American Ceramic Society Bulletin (Jun., 1977) vol. 56, No. 6, pp. 563-566.

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