Method of producing MIS structure

Adhesive bonding and miscellaneous chemical manufacture – Methods – Surface bonding and/or assembly therefor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29571, 148187, 156 11, 156 13, 357 22, 357 23, 427 88, H01L 750

Patent

active

039727564

ABSTRACT:
A method of producing an MIS structure having self-alignment construction, wherein an insulating film is formed on the surface of a semiconductor substrate, a semiconductor layer is formed on a selected area of the insulating film, parts of the insulating film are etched using the semiconductor layer as a mask, and the surface of the semiconductor layer is etched in such manner that the underlying insulating film may not be etched, whereby the marginal portion of the semiconductor layer which otherwise projects laterally beyond the underlying insulating film is caused to recede.

REFERENCES:
patent: 3474310 (1969-10-01), Ono et al.
patent: 3475234 (1969-10-01), Kerwin et al.
patent: 3646665 (1972-03-01), Kim
patent: 3700508 (1972-10-01), Keen

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of producing MIS structure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing MIS structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing MIS structure will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1927608

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.