Method of producing integral, hard nitride layer on titanium/tit

Metal treatment – Process of modifying or maintaining internal physical... – Carburizing or nitriding using externally supplied carbon or...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

148206, 148212, 148237, 428660, C21D 900, C22C 1400

Patent

active

053206860

ABSTRACT:
Objects of titanium or titanium alloys having the surface converted to a hard and wear-resistant nitride layer with good adhesion, which is distributed uniformly and also provides internal capillaries. The objects are produced by being treated in a vacuum furnace with an atmosphere of pure nitrogen gas at a temperature of 650.degree.-1000.degree. C. and at a pressure below atmospheric pressure. The thickness of the nitride layer can be controlled by controlling the treatment time and temperature.

REFERENCES:
patent: 2804410 (1957-08-01), Wyatt et al.
patent: 3642546 (1972-02-01), Van Thyne
patent: 3643658 (1972-02-01), Steinemenan
patent: 4511411 (1985-04-01), Brunner et al.
patent: 4768757 (1988-09-01), Nakamura et al.
patent: 4902359 (1990-02-01), Takeuchi et al.
patent: 5114500 (1992-05-01), Tahara et al.
Fedirko et al., English Trans. Fiz. Khim. Mekhanika Mat. No. 5, (1990), pp. 76-79.
Fedirko et al., Fiz. Khim. Mekh. Mater., 26(5), 1990, pp. 76-79, "abstract".
Badini et al., Jour. Less-Common Metals, 143, (1988), 129.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of producing integral, hard nitride layer on titanium/tit does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing integral, hard nitride layer on titanium/tit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing integral, hard nitride layer on titanium/tit will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1246076

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.