Method of producing implanted areas in a substrate

Details Method of producing implanted areas in a substrate Method of producing implanted areas in a substrate

1977-08-17

1979-01-30

Dixon, Harold A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250492B, A61K 2702

Patent

active

041374576

ABSTRACT:
Implanted areas are produced on a substrate by irradiating the surface of the substrate with two coherent high kinetic energy beams which are superimposed in relation to one another and spaced from the substrate surface in such a manner that maxima and/or minima of an interference pattern formed by the two particle streams are located on the substrate surface.

REFERENCES:
patent: 2741704 (1956-04-01), Trump et al.
patent: 3434894 (1969-03-01), Gale
patent: 3445926 (1969-05-01), Medved
patent: 3761721 (1973-09-01), Altshuler

Affiliated with

Also associated with

Rating

Method of producing implanted areas in a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing implanted areas in a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing implanted areas in a substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1152137