Patent
1997-11-13
2000-07-11
Teska, Kevin J.
G06F 1750
Patent
active
060885203
ABSTRACT:
A method of producing charged beam drawing data includes a basic figure processing step of performing a basic figure processing to design layout data to output basic figure data, a first segmenting step of converting the basic figure data as if segmenting a basic figure over a boundary of a figure processing region in the basic figure data by the boundary, a first searching step of searching a minute figure to draw which satisfies a prescribed size condition among the figures produced by segmenting in said first segmenting step, a restoring step of integrating the minute figure to draw searched by said first searching step and a figure adjacent to the minute figure, and performing a further basic figure processing to restore the figures in said basic figure data, an allocating step of allocating the figures restored by said restoring step to drawing fields, and a step of converting the figures allocated by the allocating step to charged beam drawing data.
REFERENCES:
patent: 5366847 (1994-11-01), Powers
patent: 5432714 (1995-07-01), Chung et al.
patent: 5699266 (1997-12-01), Chung et al.
patent: 5740068 (1998-04-01), Liebmann et al.
patent: 5792581 (1998-08-01), Ohnuma
patent: 5812412 (1998-09-01), Moriizumi et al.
Cheng, C-I. and Ho, C-y "SEFOP: A Novel Approach to Data Path Module Placement," IEEE/ACM International Conference on Computer-Aided Design, Nov. 1993.
Kamiyama Kinya
Moriizumi Koichi
Taoka Hironobu
Garbowski Leigh Marie
Mitsubishi Denki & Kabushiki Kaisha
Teska Kevin J.
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