Image analysis – Applications – Manufacturing or product inspection
Patent
1997-01-13
1999-11-30
Lee, Thomas D
Image analysis
Applications
Manufacturing or product inspection
324751, 250310, G06K 900, G01N 2300, G01R 31305
Patent
active
059956470
ABSTRACT:
An electron pulse signal is repeatedly radiated on a target spot applied with a certain potential for measuring a variation of secondary electron intensity, and a discrete value is assigned to each variation between the two secondary electron intensities so as to eliminate an electrical influence of an insulating passivation layer over the target spot from a potential contrast image.
REFERENCES:
patent: 4996659 (1991-02-01), Yamaguchi et al.
patent: 5521517 (1996-05-01), Shida et al.
patent: 5528156 (1996-06-01), Ueda et al.
Patent Abstracts of Japan, vol. 008, No. 213(E-269), Sep. 28, 1984, referencing JP 59099731, Jun. 8, 1984.
Patent Abstracts of Japan, vol. 95, No. 007, Aug. 31, 1995, referencing JP 07092238, Apr. 7, 1995.
"10.4. Design for Electron Beam Testability and Specimen Preparation", T.J. Alon et al., Electron Beam Testing Technology, 1993, pp. 410-415.
Chen Wenpeng
Lee Thomas D
NEC Corporation
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