Radiation imagery chemistry: process – composition – or product th – Liquid crystal process – composition – or product
Reexamination Certificate
2006-03-14
2006-03-14
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Liquid crystal process, composition, or product
C430S321000, C427S495000, C427S508000, C427S163100
Reexamination Certificate
active
07011914
ABSTRACT:
An active-radiation-curing liquid crystalline composition is applied to an alignment layer2formed on a base1, and the liquid crystal alignment is regulated by the application of heat or the like, thereby forming a liquid crystal layer3having cholesteric regularity (FIG.1(a)). Next, active radiation4with a predetermined radiant intensity is applied to the liquid crystal layer3through a photomask10(FIG.1(b)), and this liquid crystal layer3is then brought into contact with a solvent5(FIG.1(c)). As a result, the area3bin the liquid crystal layer3not irradiated with the active radiation4is removed, while the area3ain the liquid crystal layer3irradiated with the active radiation4remains; a semi-cured cholesteric layer3′ having therein a predetermined pattern is thus formed (FIG.1(d)). Thereafter, active radiation6is applied to the surface of the semi-cured cholesteric layer3′ to form a curing rate gradient in the semi-cured cholesteric layer3′ between the substrate9side surface and the surface opposite to it and cure, while retaining this curing rate gradient, the semi-cured cholesteric layer3′ to broaden its selective reflection wave range (FIG.1(e)). Lastly, the semi-cured cholesteric layer3′ is cured by the application of active radiation8while retaining the cholesteric regularity which the semi-cured cholesteric layer3′ has developed in the course of broadening of its selective reflection wave range, thereby obtaining a cured cholesteric layer3″ (FIG.1(f)).
REFERENCES:
patent: 5691789 (1997-11-01), Li et al.
patent: 6057008 (2000-05-01), Schwalb et al.
patent: 6071438 (2000-06-01), Leigeber et al.
patent: 6816215 (2004-11-01), Umeya
patent: 61-115989 (1986-06-01), None
patent: 08-281814 (1994-10-01), None
patent: 10-54905 (1998-02-01), None
patent: 10-319235 (1998-04-01), None
patent: 10-260387 (1998-09-01), None
patent: 10-316755 (1998-12-01), None
patent: WO 97/16762 (1997-05-01), None
patent: WO 00/34808 (2000-06-01), None
Dai Nippon Printing Co. Ltd.
McPherson John A.
Oliff & Berridg,e PLC
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