Method of producing anti-reflection film

Details Method of producing anti-reflection film Method of producing anti-reflection film

2008-04-01

2008-04-01

Bashore, Alain L. (Department: 1762)

Coating processes

Optical element produced

C427S164000, C427S419100, C428S212000, C428S702000, C428S328000, C428S331000

Reexamination Certificate

active

07351447

ABSTRACT:
A method of producing an anti-reflection film includes forming a first layer on a transparent substrate, forming a second layer on the first layer, and forming the third layer on the second layer. When an optical admittance Y at a surface of the second layer is represented by,Y=HE=(x+iy)where i is the imaginary number unit,thicknesses and reflective indexes of the substrate, first layer, second layer, and third layer are selected so that x and y satisfy the following formula,in-line-formulae description="In-line Formulae" end="lead"?0.9x{(n2−n02)/2n0}2<{x−(n2+n02)/2n0}2+y2<1.1x{(n2−n02)/2n0}2in-line-formulae description="In-line Formulae" end="tail"?where n is a refractive index of the third layer and n0is a refractive index of an outer region at an outside of the anti-reflection film.

REFERENCES:
patent: 5496641 (1996-03-01), Mase et al.
patent: 6104534 (2000-08-01), Ohta et al.
patent: 6248448 (2001-06-01), Lippey et al.
patent: 2001/0053438 (2001-12-01), Nishida et al.
patent: 2005/0219680 (2005-10-01), Ishikawa
patent: H09-073001 (1997-03-01), None
patent: H09-165231 (1997-06-01), None
patent: H10-186104 (1998-07-01), None
Machine english translation for portion of Japanese patent publication H09-073001; JPO, Oct. 2007.
Machine english translation for portion of Japanese patent publication H09-165231; JPO, Oct. 2007.
Machine english translation for portion of Japanese patent publication H10-186104; JPO, Oct. 2007.

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