Etching a substrate: processes – Forming or treating electrical conductor article
Reexamination Certificate
2006-05-16
2006-05-16
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Forming or treating electrical conductor article
C216S018000, C216S067000, C216S074000, C216S075000, C216S006000, C438S690000, C438S710000, C427S560000
Reexamination Certificate
active
07045070
ABSTRACT:
The electrode configuration includes at least one structured layer. A mask is produced on the layer to be structured and the layer is dry etched. The mask is at least slightly etchable by dry etching. The mask contains a metal silicide, a metal nitride or a metal oxide.
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Engelhardt Manfred
Pamler Werner
Weinrich Volker
Wendt Hermann
Ahmed Shamim
Greenberg Laurence A.
Locher Ralph E.
Stemer Werner H.
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