Method of producing an electrical resistance device

Details Method of producing an electrical resistance device Method of producing an electrical resistance device

1974-02-01

1978-05-09

Goolkasian, John T.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

338310, 427 82, 427 85, 427 88, 427102, 427108, 427123, 427124, 427125, 427259, 427265, 427266, 428203, 428208, 428209, 428210, 148 15, 148 333, 252500, 252512, 252514, 428433, 428434, B05D 306, H01C 1300, C23C 1700

Patent

active

040887995

ABSTRACT:
The process by which this device is made comprises the implantation of ions into an insulator. Surface charge on the insulator is discharged during implantation by an electron beam or by a thin conductive surface layer previously deposited on the insulator. Ion energy and dose are selected to embed ions into the insulating lattice to a sufficiently high local concentration to produce a zone of lower resistance which is the implanted zone. The dosage which presently appears to be a minimum dosage for providing a conductive zone in the insulative body is the order of 10.sup.18 ions per square centimeter. Beam currents upward from 10 microampers per centimeter square implanted areas are satisfactory.

REFERENCES:
patent: 2950996 (1960-08-01), Place et al.
patent: 3390012 (1968-06-01), Huberecht
patent: 3481776 (1969-12-01), Manchester
patent: 3523042 (1970-08-01), Bower
patent: 3562022 (1971-02-01), Shifrin
patent: 3600797 (1971-08-01), Bower
patent: 3718502 (1973-02-01), Gibbons

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