Etching a substrate: processes – Forming or treating optical article
Reexamination Certificate
2007-01-30
2007-01-30
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Forming or treating optical article
C216S096000, C216S100000, C216S102000, C216S103000, C252S079100, C252S079200
Reexamination Certificate
active
10111340
ABSTRACT:
A method of producing a reflector sheet, which method comprises treating an Al alloy sheet to increase the total reflectance of a surface of the sheet for use as a lighting reflector by bringing the sheet into contact with an acid or alkaline fluid that dissolves aluminium metal, said fluid having a viscosity of less than 0.01 Pa·s, under conditions to remove from 10 nm to 2000 nm of metal from the surface, and cutting or forming the treated Al alloy sheet into the shape of a reflector sheet.
REFERENCES:
patent: 2847286 (1958-08-01), Neunzig et al.
patent: 4247378 (1981-01-01), Harris
patent: 4483750 (1984-11-01), Powers et al.
patent: 4714528 (1987-12-01), Takeuchi et al.
patent: 4762638 (1988-08-01), Dollman et al.
patent: 5663001 (1997-09-01), Textor et al.
patent: 973243 (1959-12-01), None
patent: 0143715 (1985-06-01), None
patent: 718024 (1954-11-01), None
patent: 740880 (1955-11-01), None
patent: 1136588 (1968-12-01), None
patent: WO99/13133 (1999-03-01), None
English language Abstract of Japanese Patent Publication No. 05 112900 published May 7, 1993, Patent Abstracts of Japan, vol. 17, No. 468 published Aug. 26, 1993.
Ellard Barry Roy
Furneaux Robin Christopher
Ahmed Shamim
Cooper & DunhamLLP
Novelis Inc.
LandOfFree
Method of producing an aluminium surface with a high total... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of producing an aluminium surface with a high total..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing an aluminium surface with a high total... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3745207