Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Process of making radiation-sensitive product
Patent
1982-05-27
1984-07-17
Martin, Jr., Roland E.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Process of making radiation-sensitive product
430136, 427 39, G03G 5082, B05D 306
Patent
active
044606737
ABSTRACT:
Disclosed are method and apparatus for producing amorphous silicon layers for solar cells or electrophotography by plasma-enhanced chemical vapor deposition (CVD) through glow-discharge decomposition of a reaction gas containing monosilane or a higher order silicon hydride in a reaction chamber. Deposition rate and efficiency of reaction gas usage are improved by the selective removal of hydrogen gas reaction product from the reaction chamber. In one embodiment, a filter which is more permeable to hydrogen gas than to the reaction gas is placed in the vacuum pumping port of the reaction chamber. The filter comprises either a palladium film or a bundle of small diameter tubes made from a polyimide system polymer. In another embodiment of the invention, a porous sintered material containing La-Ni alloy is used to selectively adsorb hydrogen gas in the reaction chamber. In still another embodiment of the invention, a trap which collects reaction gas but passes hydrogen gas is used in the vacuum pump line connected to the chamber. The trap comprises a cell cooled to liquid nitrogen temperature for condensing the reaction gas but not the hydrogen. The collected reaction gas is recycled through the reaction chamber. The removal rate of hydrogen gas is controlled to maintain a desired hydrogen density in the reaction chamber, the hydrogen density being monitored by observing the intensity of hydrogen spectral lines in the glow discharge in the reaction chamber.
REFERENCES:
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patent: 4328258 (1982-05-01), Coleman
patent: 4357179 (1982-11-01), Adams et al.
D. E. Carlson et al., "Properties of Amorphous Silicon and A-Si Solar Cells", RCA Review, vol. 38, pp. 211 to 225, Jun. 1977.
B. A. Scott et al., "Glow Discharge Preparation of Amorphous Hydrogenated Silicon from Higher Silanes", Appln. Phip. Letters 37(8), pp. 725 to 727, Oct. 1980.
Kazama Toyoki
Sukigara Kunio
Fuji Electric Company Ltd.
Martin Jr. Roland E.
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