Method of producing acicular magnetic alloy particles

Metal treatment – Process of modifying or maintaining internal physical... – Magnetic materials

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

75348, H01F 103

Patent

active

057359695

ABSTRACT:
The present invention is a method for making highly stable magnetic alloy particles with high coercivities and high saturation magnetization comprising the steps of:
a) providing a precursor selected from the group consisting of iron oxide hydroxide particles and iron oxide particles, wherein the precursor particle comprises from about 15 to about 45 atomic % Co based on amount of Fe present,
b) reducing the precursor particles to magnetic alloy particles,
c) passivating the magnetic alloy particles in an oxygen-containing atmosphere at a temperature between about 20.degree. and 100.degree. C.,
d) annealing the passivated magnetic alloy particles in an inert atmosphere at a temperature from about 120.degree. to about 450.degree. C., and
e) further oxidizing the annealed magnetic alloy particles in an oxygen-containing atmosphere.

REFERENCES:
patent: 3520676 (1970-07-01), Stahr
patent: 4133677 (1979-01-01), Matsui et al.
patent: 4318735 (1982-03-01), Mishima et al.
patent: 4608093 (1986-08-01), Umemura et al.
patent: 5151115 (1992-09-01), Tamai
patent: 5188898 (1993-02-01), Tagawa et al.
patent: 5252380 (1993-10-01), Nakazumi et al.
patent: 5260132 (1993-11-01), Nakazumi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of producing acicular magnetic alloy particles does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing acicular magnetic alloy particles, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing acicular magnetic alloy particles will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-9230

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.